ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, KIT INCLUDING ANTIREFLECTION FILM AND CLEANING CLOTH

There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of conc...

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Bibliographische Detailangaben
Hauptverfasser: ADEGAWA YUTAKA, IBUKI SHUNTARO
Format: Patent
Sprache:eng
Schlagworte:
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