ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, KIT INCLUDING ANTIREFLECTION FILM AND CLEANING CLOTH
There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of conc...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | ADEGAWA YUTAKA IBUKI SHUNTARO |
| description | There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of concave portions to an average cycle is from 1.0 to 3.0, a water contact angle to an unevenness structure surface is 100° or more, and a specular reflectance is 2.0% or less. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2016091635A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2016091635A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2016091635A13</originalsourceid><addsrcrecordid>eNrjZChz9AvxDHJ183F1DvH091Nw8_Tx1VHwdfQLdXN0DgkN8vRzV_B1DfHwd1Hwd1PAqtjbM0TB08_ZJ9QFpBiLEqCYi4Kzj6ujH0iBs49_iAcPA2taYk5xKi-U5mZQdnMNcfbQTS3Ij08tLkhMTs1LLYkPDTYyMDQzsDQ0MzZ1NDQmThUAB-46RQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, KIT INCLUDING ANTIREFLECTION FILM AND CLEANING CLOTH</title><source>esp@cenet</source><creator>ADEGAWA YUTAKA ; IBUKI SHUNTARO</creator><creatorcontrib>ADEGAWA YUTAKA ; IBUKI SHUNTARO</creatorcontrib><description>There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of concave portions to an average cycle is from 1.0 to 3.0, a water contact angle to an unevenness structure surface is 100° or more, and a specular reflectance is 2.0% or less.</description><language>eng</language><subject>CLEANING ; CLEANING IN GENERAL ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PERFORMING OPERATIONS ; PHYSICS ; PREVENTION OF FOULING IN GENERAL ; TRANSPORTING</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160331&DB=EPODOC&CC=US&NR=2016091635A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160331&DB=EPODOC&CC=US&NR=2016091635A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ADEGAWA YUTAKA</creatorcontrib><creatorcontrib>IBUKI SHUNTARO</creatorcontrib><title>ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, KIT INCLUDING ANTIREFLECTION FILM AND CLEANING CLOTH</title><description>There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of concave portions to an average cycle is from 1.0 to 3.0, a water contact angle to an unevenness structure surface is 100° or more, and a specular reflectance is 2.0% or less.</description><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZChz9AvxDHJ183F1DvH091Nw8_Tx1VHwdfQLdXN0DgkN8vRzV_B1DfHwd1Hwd1PAqtjbM0TB08_ZJ9QFpBiLEqCYi4Kzj6ujH0iBs49_iAcPA2taYk5xKi-U5mZQdnMNcfbQTS3Ij08tLkhMTs1LLYkPDTYyMDQzsDQ0MzZ1NDQmThUAB-46RQ</recordid><startdate>20160331</startdate><enddate>20160331</enddate><creator>ADEGAWA YUTAKA</creator><creator>IBUKI SHUNTARO</creator><scope>EVB</scope></search><sort><creationdate>20160331</creationdate><title>ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, KIT INCLUDING ANTIREFLECTION FILM AND CLEANING CLOTH</title><author>ADEGAWA YUTAKA ; IBUKI SHUNTARO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2016091635A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ADEGAWA YUTAKA</creatorcontrib><creatorcontrib>IBUKI SHUNTARO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ADEGAWA YUTAKA</au><au>IBUKI SHUNTARO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, KIT INCLUDING ANTIREFLECTION FILM AND CLEANING CLOTH</title><date>2016-03-31</date><risdate>2016</risdate><abstract>There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of concave portions to an average cycle is from 1.0 to 3.0, a water contact angle to an unevenness structure surface is 100° or more, and a specular reflectance is 2.0% or less.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2016091635A1 |
| source | esp@cenet |
| subjects | CLEANING CLEANING IN GENERAL OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PERFORMING OPERATIONS PHYSICS PREVENTION OF FOULING IN GENERAL TRANSPORTING |
| title | ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, KIT INCLUDING ANTIREFLECTION FILM AND CLEANING CLOTH |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T23%3A47%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ADEGAWA%20YUTAKA&rft.date=2016-03-31&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2016091635A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |