SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD
A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interferin...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KLEEMANS NIEK ANTONIUS JACOBUS MARIA HULTERMANS RONALD JOHANNES RENKENS BENEDICTUS MATHIJS SWINKELS GERARDUS HUBERTUS PETRUS MARIA GLUSHKOV DENIS ALEXANDROVICH VERSPEEK CHRISTIAAN JOHANNES PETRUS |
| description | A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2016054663A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2016054663A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2016054663A13</originalsourceid><addsrcrecordid>eNrjZLAN9g8NcnZVcPb38XF1DvEPUnAMCHAMcgwJDdZR8PEM8fB3D3IM8PB0RogrOPq5KPi6AqVceBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJfGiwkYGhmYGpiZmZsaOhMXGqAO9lKvI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD</title><source>esp@cenet</source><creator>KLEEMANS NIEK ANTONIUS JACOBUS MARIA ; HULTERMANS RONALD JOHANNES ; RENKENS BENEDICTUS MATHIJS ; SWINKELS GERARDUS HUBERTUS PETRUS MARIA ; GLUSHKOV DENIS ALEXANDROVICH ; VERSPEEK CHRISTIAAN JOHANNES PETRUS</creator><creatorcontrib>KLEEMANS NIEK ANTONIUS JACOBUS MARIA ; HULTERMANS RONALD JOHANNES ; RENKENS BENEDICTUS MATHIJS ; SWINKELS GERARDUS HUBERTUS PETRUS MARIA ; GLUSHKOV DENIS ALEXANDROVICH ; VERSPEEK CHRISTIAAN JOHANNES PETRUS</creatorcontrib><description>A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; X-RAY TECHNIQUE</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160225&DB=EPODOC&CC=US&NR=2016054663A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160225&DB=EPODOC&CC=US&NR=2016054663A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KLEEMANS NIEK ANTONIUS JACOBUS MARIA</creatorcontrib><creatorcontrib>HULTERMANS RONALD JOHANNES</creatorcontrib><creatorcontrib>RENKENS BENEDICTUS MATHIJS</creatorcontrib><creatorcontrib>SWINKELS GERARDUS HUBERTUS PETRUS MARIA</creatorcontrib><creatorcontrib>GLUSHKOV DENIS ALEXANDROVICH</creatorcontrib><creatorcontrib>VERSPEEK CHRISTIAAN JOHANNES PETRUS</creatorcontrib><title>SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD</title><description>A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAN9g8NcnZVcPb38XF1DvEPUnAMCHAMcgwJDdZR8PEM8fB3D3IM8PB0RogrOPq5KPi6AqVceBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJfGiwkYGhmYGpiZmZsaOhMXGqAO9lKvI</recordid><startdate>20160225</startdate><enddate>20160225</enddate><creator>KLEEMANS NIEK ANTONIUS JACOBUS MARIA</creator><creator>HULTERMANS RONALD JOHANNES</creator><creator>RENKENS BENEDICTUS MATHIJS</creator><creator>SWINKELS GERARDUS HUBERTUS PETRUS MARIA</creator><creator>GLUSHKOV DENIS ALEXANDROVICH</creator><creator>VERSPEEK CHRISTIAAN JOHANNES PETRUS</creator><scope>EVB</scope></search><sort><creationdate>20160225</creationdate><title>SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD</title><author>KLEEMANS NIEK ANTONIUS JACOBUS MARIA ; HULTERMANS RONALD JOHANNES ; RENKENS BENEDICTUS MATHIJS ; SWINKELS GERARDUS HUBERTUS PETRUS MARIA ; GLUSHKOV DENIS ALEXANDROVICH ; VERSPEEK CHRISTIAAN JOHANNES PETRUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2016054663A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>KLEEMANS NIEK ANTONIUS JACOBUS MARIA</creatorcontrib><creatorcontrib>HULTERMANS RONALD JOHANNES</creatorcontrib><creatorcontrib>RENKENS BENEDICTUS MATHIJS</creatorcontrib><creatorcontrib>SWINKELS GERARDUS HUBERTUS PETRUS MARIA</creatorcontrib><creatorcontrib>GLUSHKOV DENIS ALEXANDROVICH</creatorcontrib><creatorcontrib>VERSPEEK CHRISTIAAN JOHANNES PETRUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KLEEMANS NIEK ANTONIUS JACOBUS MARIA</au><au>HULTERMANS RONALD JOHANNES</au><au>RENKENS BENEDICTUS MATHIJS</au><au>SWINKELS GERARDUS HUBERTUS PETRUS MARIA</au><au>GLUSHKOV DENIS ALEXANDROVICH</au><au>VERSPEEK CHRISTIAAN JOHANNES PETRUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD</title><date>2016-02-25</date><risdate>2016</risdate><abstract>A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2016054663A1 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE |
| title | SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-16T23%3A54%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KLEEMANS%20NIEK%20ANTONIUS%20JACOBUS%20MARIA&rft.date=2016-02-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2016054663A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |