EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT
The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports...
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| creator | LUETKE HELMUT STRUEWE VOLKER SCHWAN ROLF |
| description | The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an air distribution assembly having an air chamber that is disposed adjacent to the lamps and pressurized to provide uniform distribution of air exiting the air chamber to impinge a backside of each of the lamps. The air exiting the chamber and impinging the lamps is controlled by monitoring the temperature of the lamps and/or the irradiance emitting from the lamps. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2016041468A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2016041468A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2016041468A13</originalsourceid><addsrcrecordid>eNqNjL0KwjAUhbs4iPoOF5yFRktxDfbGBMwPyY24lSJxEi3UB_GRjdJNBKdzOD_ftHjiydkQPQJ3jntOMQA3DXDQSNI2IKyHz0aZfU6dtGQDmqBIHRHwgBoNfV-cx4wbP1npbXOhQXirgST-QM2LyaW7Dmkx6qxYCqSdXKX-3qah787plh5tDOuS1WXFqnrL2ea_1QtcMEGW</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT</title><source>esp@cenet</source><creator>LUETKE HELMUT ; STRUEWE VOLKER ; SCHWAN ROLF</creator><creatorcontrib>LUETKE HELMUT ; STRUEWE VOLKER ; SCHWAN ROLF</creatorcontrib><description>The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an air distribution assembly having an air chamber that is disposed adjacent to the lamps and pressurized to provide uniform distribution of air exiting the air chamber to impinge a backside of each of the lamps. The air exiting the chamber and impinging the lamps is controlled by monitoring the temperature of the lamps and/or the irradiance emitting from the lamps.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; LINING MACHINES ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PRINTING ; PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES ; STAMPS ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160211&DB=EPODOC&CC=US&NR=2016041468A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160211&DB=EPODOC&CC=US&NR=2016041468A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LUETKE HELMUT</creatorcontrib><creatorcontrib>STRUEWE VOLKER</creatorcontrib><creatorcontrib>SCHWAN ROLF</creatorcontrib><title>EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT</title><description>The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an air distribution assembly having an air chamber that is disposed adjacent to the lamps and pressurized to provide uniform distribution of air exiting the air chamber to impinge a backside of each of the lamps. The air exiting the chamber and impinging the lamps is controlled by monitoring the temperature of the lamps and/or the irradiance emitting from the lamps.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>LINING MACHINES</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PRINTING</subject><subject>PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES</subject><subject>STAMPS</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjL0KwjAUhbs4iPoOF5yFRktxDfbGBMwPyY24lSJxEi3UB_GRjdJNBKdzOD_ftHjiydkQPQJ3jntOMQA3DXDQSNI2IKyHz0aZfU6dtGQDmqBIHRHwgBoNfV-cx4wbP1npbXOhQXirgST-QM2LyaW7Dmkx6qxYCqSdXKX-3qah787plh5tDOuS1WXFqnrL2ea_1QtcMEGW</recordid><startdate>20160211</startdate><enddate>20160211</enddate><creator>LUETKE HELMUT</creator><creator>STRUEWE VOLKER</creator><creator>SCHWAN ROLF</creator><scope>EVB</scope></search><sort><creationdate>20160211</creationdate><title>EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT</title><author>LUETKE HELMUT ; STRUEWE VOLKER ; SCHWAN ROLF</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2016041468A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>LINING MACHINES</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PRINTING</topic><topic>PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES</topic><topic>STAMPS</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>LUETKE HELMUT</creatorcontrib><creatorcontrib>STRUEWE VOLKER</creatorcontrib><creatorcontrib>SCHWAN ROLF</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LUETKE HELMUT</au><au>STRUEWE VOLKER</au><au>SCHWAN ROLF</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT</title><date>2016-02-11</date><risdate>2016</risdate><abstract>The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an air distribution assembly having an air chamber that is disposed adjacent to the lamps and pressurized to provide uniform distribution of air exiting the air chamber to impinge a backside of each of the lamps. The air exiting the chamber and impinging the lamps is controlled by monitoring the temperature of the lamps and/or the irradiance emitting from the lamps.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TRANSPORTING TYPEWRITERS |
| title | EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT |
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