ACTIVE MATRIX SUBSTRATE, DISPLAY DEVICE, DEFECT MODIFICATION METHOD FOR DISPLAY DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
An active matrix substrate (10) includes a first line (101), a second line (102), a third line (103), a fourth line (104) and a fifth line (105) provided in a non-display region F. The first line crosses a non-input-side end portion of at least one bus line of a first bus line group with an insulati...
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creator | ITOH RYOHKI |
description | An active matrix substrate (10) includes a first line (101), a second line (102), a third line (103), a fourth line (104) and a fifth line (105) provided in a non-display region F. The first line crosses a non-input-side end portion of at least one bus line of a first bus line group with an insulating layer interposed therebetween. The second line crosses a non-input-side end portion of at least one bus line of a second bus line group with an insulating layer interposed therebetween. The third line crosses an input-side end portion of the first bus line group with an insulating layer interposed therebetween, and does not cross the second bus line group. The fourth line crosses an input-side end portion of the second bus line group with an insulating layer interposed therebetween, and does not cross the first bus line group. The fifth line is routed so as to cross the first, second, third and fourth lines with an insulating layer interposed therebetween. The third line and the fourth line are electrically separated from each other. |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | ACTIVE MATRIX SUBSTRATE, DISPLAY DEVICE, DEFECT MODIFICATION METHOD FOR DISPLAY DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE |
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