Semiconductor Integrated Circuit Fabrication With Pattern-Reversing Process

A method of fabricating a semiconductor integrated circuit (IC) is disclosed. An inverse mask is provided. A sacrificial layer is deposited over a substrate. A patterned photoresist layer is formed over the sacrificial layer using the inverse mask. The sacrificial layer is then etched through the pa...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHIEN MINGIN, CHANG SHU-HAO, CHIEN SHANGIEH, WU JUIING, CHEN JENG-HORNG, CHAUNG JEN-YANG, KAU KUOANG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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