HYBRID IMPEDANCE MATCHING FOR INDUCTIVELY COUPLED PLASMA SYSTEM

In one aspect, a system includes a generator configured to generate and tune a frequency of a supply signal. The system includes an auto-matching network configured to receive the supply signal and to generate an impedance-matched signal for use in powering a plasma system. In some implementations,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	THOMAS GEORGE, JUAREZ FRANCISCO J, WONGSENAKHUM PANYA
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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