HYBRID IMPEDANCE MATCHING FOR INDUCTIVELY COUPLED PLASMA SYSTEM
In one aspect, a system includes a generator configured to generate and tune a frequency of a supply signal. The system includes an auto-matching network configured to receive the supply signal and to generate an impedance-matched signal for use in powering a plasma system. In some implementations,...
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creator | THOMAS GEORGE JUAREZ FRANCISCO J WONGSENAKHUM PANYA |
description | In one aspect, a system includes a generator configured to generate and tune a frequency of a supply signal. The system includes an auto-matching network configured to receive the supply signal and to generate an impedance-matched signal for use in powering a plasma system. In some implementations, during a first stage of an impedance matching operation, the generator is configured to tune the frequency of the supply signal until the generator identifies a frequency for which the reactance of the generator and the reactance of the load are best matched. In some implementations, during a second stage of the impedance matching operation, the auto-matching network is configured to tune a tuning element within the auto-matching network until the auto-matching network identifies a tuning of the tuning element for which the resistance of the generator and the resistance of the load are best matched. |
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subjects | ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS |
title | HYBRID IMPEDANCE MATCHING FOR INDUCTIVELY COUPLED PLASMA SYSTEM |
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