THERMAL MODULE FOR A SAMPLE PROCESSING ASSEMBLY
A thermal system for controllably altering a temperature within a reaction chamber in a sample processing assembly is described. The reaction chamber is bounded by a substrate and cover member in the sample processing assembly. The thermal system includes at least one thermal generator for generatin...
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creator | FAVALORO ANTHONY BOYES GREGORY WILLIAM NG KENNETH HENGONG BAGNATO STEPHEN JOHN TOOGOOD PETER |
description | A thermal system for controllably altering a temperature within a reaction chamber in a sample processing assembly is described. The reaction chamber is bounded by a substrate and cover member in the sample processing assembly. The thermal system includes at least one thermal generator for generating temperature changes, one or more transfer layers for transferring temperature changes between the thermal generator and the sample on the substrate and a fluid isolator for isolating the thermal generator from fluid dispensed into the reaction chamber. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2015308931A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2015308931A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2015308931A13</originalsourceid><addsrcrecordid>eNrjZNAP8XAN8nX0UfD1dwn1cVVw8w9ScFQIdvQNAHICgvydXYODPf3cFRyDg119nXwieRhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJfGiwkYGhqbGBhaWxoaOhMXGqAJcwJuQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>THERMAL MODULE FOR A SAMPLE PROCESSING ASSEMBLY</title><source>esp@cenet</source><creator>FAVALORO ANTHONY ; BOYES GREGORY WILLIAM ; NG KENNETH HENGONG ; BAGNATO STEPHEN JOHN ; TOOGOOD PETER</creator><creatorcontrib>FAVALORO ANTHONY ; BOYES GREGORY WILLIAM ; NG KENNETH HENGONG ; BAGNATO STEPHEN JOHN ; TOOGOOD PETER</creatorcontrib><description>A thermal system for controllably altering a temperature within a reaction chamber in a sample processing assembly is described. The reaction chamber is bounded by a substrate and cover member in the sample processing assembly. The thermal system includes at least one thermal generator for generating temperature changes, one or more transfer layers for transferring temperature changes between the thermal generator and the sample on the substrate and a fluid isolator for isolating the thermal generator from fluid dispensed into the reaction chamber.</description><language>eng</language><subject>BLASTING ; CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE ; DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION ; HEAT EXCHANGE IN GENERAL ; HEATING ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; LIGHTING ; MEASURING ; MECHANICAL ENGINEERING ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PHYSICS ; TESTING ; TRANSPORTING ; WEAPONS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151029&DB=EPODOC&CC=US&NR=2015308931A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151029&DB=EPODOC&CC=US&NR=2015308931A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FAVALORO ANTHONY</creatorcontrib><creatorcontrib>BOYES GREGORY WILLIAM</creatorcontrib><creatorcontrib>NG KENNETH HENGONG</creatorcontrib><creatorcontrib>BAGNATO STEPHEN JOHN</creatorcontrib><creatorcontrib>TOOGOOD PETER</creatorcontrib><title>THERMAL MODULE FOR A SAMPLE PROCESSING ASSEMBLY</title><description>A thermal system for controllably altering a temperature within a reaction chamber in a sample processing assembly is described. The reaction chamber is bounded by a substrate and cover member in the sample processing assembly. The thermal system includes at least one thermal generator for generating temperature changes, one or more transfer layers for transferring temperature changes between the thermal generator and the sample on the substrate and a fluid isolator for isolating the thermal generator from fluid dispensed into the reaction chamber.</description><subject>BLASTING</subject><subject>CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE</subject><subject>DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION</subject><subject>HEAT EXCHANGE IN GENERAL</subject><subject>HEATING</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>LIGHTING</subject><subject>MEASURING</subject><subject>MECHANICAL ENGINEERING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PHYSICS</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAP8XAN8nX0UfD1dwn1cVVw8w9ScFQIdvQNAHICgvydXYODPf3cFRyDg119nXwieRhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJfGiwkYGhqbGBhaWxoaOhMXGqAJcwJuQ</recordid><startdate>20151029</startdate><enddate>20151029</enddate><creator>FAVALORO ANTHONY</creator><creator>BOYES GREGORY WILLIAM</creator><creator>NG KENNETH HENGONG</creator><creator>BAGNATO STEPHEN JOHN</creator><creator>TOOGOOD PETER</creator><scope>EVB</scope></search><sort><creationdate>20151029</creationdate><title>THERMAL MODULE FOR A SAMPLE PROCESSING ASSEMBLY</title><author>FAVALORO ANTHONY ; BOYES GREGORY WILLIAM ; NG KENNETH HENGONG ; BAGNATO STEPHEN JOHN ; TOOGOOD PETER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2015308931A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>BLASTING</topic><topic>CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE</topic><topic>DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION</topic><topic>HEAT EXCHANGE IN GENERAL</topic><topic>HEATING</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>LIGHTING</topic><topic>MEASURING</topic><topic>MECHANICAL ENGINEERING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PHYSICS</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>FAVALORO ANTHONY</creatorcontrib><creatorcontrib>BOYES GREGORY WILLIAM</creatorcontrib><creatorcontrib>NG KENNETH HENGONG</creatorcontrib><creatorcontrib>BAGNATO STEPHEN JOHN</creatorcontrib><creatorcontrib>TOOGOOD PETER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FAVALORO ANTHONY</au><au>BOYES GREGORY WILLIAM</au><au>NG KENNETH HENGONG</au><au>BAGNATO STEPHEN JOHN</au><au>TOOGOOD PETER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>THERMAL MODULE FOR A SAMPLE PROCESSING ASSEMBLY</title><date>2015-10-29</date><risdate>2015</risdate><abstract>A thermal system for controllably altering a temperature within a reaction chamber in a sample processing assembly is described. The reaction chamber is bounded by a substrate and cover member in the sample processing assembly. The thermal system includes at least one thermal generator for generating temperature changes, one or more transfer layers for transferring temperature changes between the thermal generator and the sample on the substrate and a fluid isolator for isolating the thermal generator from fluid dispensed into the reaction chamber.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BLASTING CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OFGENERAL APPLICATION HEAT EXCHANGE IN GENERAL HEATING INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES LIGHTING MEASURING MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS TESTING TRANSPORTING WEAPONS |
title | THERMAL MODULE FOR A SAMPLE PROCESSING ASSEMBLY |
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