SOLUTION PROCESSING APPARATUS, SOLUTION PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

According to an embodiment of the present disclosure, an apparatus is configured to perform a solution process by supplying a processing solution from a processing solution supply source to the substrate held on a substrate holder via a flow path member and a nozzle at a flow rate equal to or less t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ANDO RYOJI, SATOH TAKAMI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL MEASURING MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL METERING BY VOLUME PERFORMING OPERATIONS PHYSICS SPRAYING OR ATOMISING IN GENERAL TESTING TRANSPORTING
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