SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME

A method of manufacturing a semiconductor device is disclosed. In the method, a substrate having a first surface and a second surface is provided. The second surface is opposed to the first surface. A via hole is formed to penetrate the substrate from the first surface toward the second surface. The...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: PARK SEUNG-HOON, KOO DEOG-JA, MIN GYUNG-JIN
Format: Patent
Sprache:eng
Schlagworte:
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