SUBSTRATE TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM
The present invention is a method of treating a substrate using a block copolymer containing a first polymer and a second polymer, the method including: a block copolymer coating step of applying the block copolymer onto a substrate or a base film applied on the substrate; and a polymer separation s...
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| creator | MURAMATSU MAKOTO TOMITA TADATOSHI YANO KAZUTOSHI TANOUCHI KEIJI SHIGETOMI KENICHI TOYOZAWA AKIHIRO KITANO TAKAHIRO |
| description | The present invention is a method of treating a substrate using a block copolymer containing a first polymer and a second polymer, the method including: a block copolymer coating step of applying the block copolymer onto a substrate or a base film applied on the substrate; and a polymer separation step of phase-separating the block copolymer into the first polymer and the second polymer by thermally treating the block copolymer on the substrate in a non-oxidizing gas atmosphere. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2015228512A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2015228512A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2015228512A13</originalsourceid><addsrcrecordid>eNrjZIgJDnUKDglyDHFVCAlydQzxdfULUfB1DfHwd9FRcPb3DQgNcQ3SBcq4ODr5uCoEh_gHObq7AlW4eIb66ig4-rkoYDMhODI4xNWXh4E1LTGnOJUXSnMzKLu5hjh76KYW5MenFhckJqfmpZbEhwYbGRiaGhlZmBoaORoaE6cKALicM6Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUBSTRATE TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM</title><source>esp@cenet</source><creator>MURAMATSU MAKOTO ; TOMITA TADATOSHI ; YANO KAZUTOSHI ; TANOUCHI KEIJI ; SHIGETOMI KENICHI ; TOYOZAWA AKIHIRO ; KITANO TAKAHIRO</creator><creatorcontrib>MURAMATSU MAKOTO ; TOMITA TADATOSHI ; YANO KAZUTOSHI ; TANOUCHI KEIJI ; SHIGETOMI KENICHI ; TOYOZAWA AKIHIRO ; KITANO TAKAHIRO</creatorcontrib><description>The present invention is a method of treating a substrate using a block copolymer containing a first polymer and a second polymer, the method including: a block copolymer coating step of applying the block copolymer onto a substrate or a base film applied on the substrate; and a polymer separation step of phase-separating the block copolymer into the first polymer and the second polymer by thermally treating the block copolymer on the substrate in a non-oxidizing gas atmosphere.</description><language>eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150813&DB=EPODOC&CC=US&NR=2015228512A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150813&DB=EPODOC&CC=US&NR=2015228512A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MURAMATSU MAKOTO</creatorcontrib><creatorcontrib>TOMITA TADATOSHI</creatorcontrib><creatorcontrib>YANO KAZUTOSHI</creatorcontrib><creatorcontrib>TANOUCHI KEIJI</creatorcontrib><creatorcontrib>SHIGETOMI KENICHI</creatorcontrib><creatorcontrib>TOYOZAWA AKIHIRO</creatorcontrib><creatorcontrib>KITANO TAKAHIRO</creatorcontrib><title>SUBSTRATE TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM</title><description>The present invention is a method of treating a substrate using a block copolymer containing a first polymer and a second polymer, the method including: a block copolymer coating step of applying the block copolymer onto a substrate or a base film applied on the substrate; and a polymer separation step of phase-separating the block copolymer into the first polymer and the second polymer by thermally treating the block copolymer on the substrate in a non-oxidizing gas atmosphere.</description><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgJDnUKDglyDHFVCAlydQzxdfULUfB1DfHwd9FRcPb3DQgNcQ3SBcq4ODr5uCoEh_gHObq7AlW4eIb66ig4-rkoYDMhODI4xNWXh4E1LTGnOJUXSnMzKLu5hjh76KYW5MenFhckJqfmpZbEhwYbGRiaGhlZmBoaORoaE6cKALicM6Q</recordid><startdate>20150813</startdate><enddate>20150813</enddate><creator>MURAMATSU MAKOTO</creator><creator>TOMITA TADATOSHI</creator><creator>YANO KAZUTOSHI</creator><creator>TANOUCHI KEIJI</creator><creator>SHIGETOMI KENICHI</creator><creator>TOYOZAWA AKIHIRO</creator><creator>KITANO TAKAHIRO</creator><scope>EVB</scope></search><sort><creationdate>20150813</creationdate><title>SUBSTRATE TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM</title><author>MURAMATSU MAKOTO ; TOMITA TADATOSHI ; YANO KAZUTOSHI ; TANOUCHI KEIJI ; SHIGETOMI KENICHI ; TOYOZAWA AKIHIRO ; KITANO TAKAHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2015228512A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MURAMATSU MAKOTO</creatorcontrib><creatorcontrib>TOMITA TADATOSHI</creatorcontrib><creatorcontrib>YANO KAZUTOSHI</creatorcontrib><creatorcontrib>TANOUCHI KEIJI</creatorcontrib><creatorcontrib>SHIGETOMI KENICHI</creatorcontrib><creatorcontrib>TOYOZAWA AKIHIRO</creatorcontrib><creatorcontrib>KITANO TAKAHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MURAMATSU MAKOTO</au><au>TOMITA TADATOSHI</au><au>YANO KAZUTOSHI</au><au>TANOUCHI KEIJI</au><au>SHIGETOMI KENICHI</au><au>TOYOZAWA AKIHIRO</au><au>KITANO TAKAHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM</title><date>2015-08-13</date><risdate>2015</risdate><abstract>The present invention is a method of treating a substrate using a block copolymer containing a first polymer and a second polymer, the method including: a block copolymer coating step of applying the block copolymer onto a substrate or a base film applied on the substrate; and a polymer separation step of phase-separating the block copolymer into the first polymer and the second polymer by thermally treating the block copolymer on the substrate in a non-oxidizing gas atmosphere.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | SUBSTRATE TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM |
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