PLASMA PROCESSING APPARATUS
In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the vi...
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| creator | TANIMURA HIDENOBU KUSUMOTO HIRONORI KITADA HIROHO KAWAKAMI MASATOSHI KIHARA HIDEKI NAKAMURA TSUTOMU |
| description | In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2015214083A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2015214083A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2015214083A13</originalsourceid><addsrcrecordid>eNrjZJAO8HEM9nVUCAjyd3YNDvb0c1dwDAhwDHIMCQ3mYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBoamRoYmBhbGjobGxKkCAORLIZY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PLASMA PROCESSING APPARATUS</title><source>esp@cenet</source><creator>TANIMURA HIDENOBU ; KUSUMOTO HIRONORI ; KITADA HIROHO ; KAWAKAMI MASATOSHI ; KIHARA HIDEKI ; NAKAMURA TSUTOMU</creator><creatorcontrib>TANIMURA HIDENOBU ; KUSUMOTO HIRONORI ; KITADA HIROHO ; KAWAKAMI MASATOSHI ; KIHARA HIDEKI ; NAKAMURA TSUTOMU</creatorcontrib><description>In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; COLORIMETRY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT ; MEASURING ; PHYSICS ; RADIATION PYROMETRY ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150730&DB=EPODOC&CC=US&NR=2015214083A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150730&DB=EPODOC&CC=US&NR=2015214083A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANIMURA HIDENOBU</creatorcontrib><creatorcontrib>KUSUMOTO HIRONORI</creatorcontrib><creatorcontrib>KITADA HIROHO</creatorcontrib><creatorcontrib>KAWAKAMI MASATOSHI</creatorcontrib><creatorcontrib>KIHARA HIDEKI</creatorcontrib><creatorcontrib>NAKAMURA TSUTOMU</creatorcontrib><title>PLASMA PROCESSING APPARATUS</title><description>In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>COLORIMETRY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>RADIATION PYROMETRY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAO8HEM9nVUCAjyd3YNDvb0c1dwDAhwDHIMCQ3mYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBoamRoYmBhbGjobGxKkCAORLIZY</recordid><startdate>20150730</startdate><enddate>20150730</enddate><creator>TANIMURA HIDENOBU</creator><creator>KUSUMOTO HIRONORI</creator><creator>KITADA HIROHO</creator><creator>KAWAKAMI MASATOSHI</creator><creator>KIHARA HIDEKI</creator><creator>NAKAMURA TSUTOMU</creator><scope>EVB</scope></search><sort><creationdate>20150730</creationdate><title>PLASMA PROCESSING APPARATUS</title><author>TANIMURA HIDENOBU ; KUSUMOTO HIRONORI ; KITADA HIROHO ; KAWAKAMI MASATOSHI ; KIHARA HIDEKI ; NAKAMURA TSUTOMU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2015214083A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>COLORIMETRY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>RADIATION PYROMETRY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TANIMURA HIDENOBU</creatorcontrib><creatorcontrib>KUSUMOTO HIRONORI</creatorcontrib><creatorcontrib>KITADA HIROHO</creatorcontrib><creatorcontrib>KAWAKAMI MASATOSHI</creatorcontrib><creatorcontrib>KIHARA HIDEKI</creatorcontrib><creatorcontrib>NAKAMURA TSUTOMU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANIMURA HIDENOBU</au><au>KUSUMOTO HIRONORI</au><au>KITADA HIROHO</au><au>KAWAKAMI MASATOSHI</au><au>KIHARA HIDEKI</au><au>NAKAMURA TSUTOMU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PLASMA PROCESSING APPARATUS</title><date>2015-07-30</date><risdate>2015</risdate><abstract>In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20° C. to 25° C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS COLORIMETRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING PHYSICS RADIATION PYROMETRY SEMICONDUCTOR DEVICES TESTING |
| title | PLASMA PROCESSING APPARATUS |
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