LATERAL DOUBLE-DIFFUSED METAL-OXIDE-SEMICONUDCTOR TRANSISTOR DEVICE AND LAYOUT PATTERN FOR LDMOS TRANSISTOR DEVICE

A LDMOS transistor device includes a substrate including a first insulating structure formed therein, a gate formed on the substrate and covering a portion of the first insulating structure, a drain region and a source region formed in the substrate at two respective sides of the gate, a base region...

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Bibliographische Detailangaben
Hauptverfasser: CHANG KAING, CHOU KUN-YI, HUANG BO-JUI, LIN AN-HUNG, LIU HSIAO-WEN
Format: Patent
Sprache:eng
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