METHOD AND APPARATUS FOR PLASMA PROCESSING

The present invention provides a plasma processing method that uses a plasma processing apparatus including a plasma processing chamber in which a sample is plasma processed, a first radio-frequency power supply that supplies a first radio-frequency power for generating plasma, and a second radio-fr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MUTO SATORU, OHGOSHI YASUO, EITOKU HIROFUMI, ONO TETSUO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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