PLASMA DEVICE AND OPERATION METHOD OF PLASMA DEVICE

A plasma device includes a dielectric barrier, a first electrode structure, a second electrode structure, and a third electrode structure. The dielectric barrier has an upstream terminal and a downstream terminal and defines a space, in which the first electrode structure is disposed. A gap with mul...

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Bibliographische Detailangaben
Hauptverfasser: WENG CHIHIANG, HSU JUI-MEI, TSAI CHEN-DER, DU CHENUNG
Format: Patent
Sprache:eng
Schlagworte:
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