CHAMBER CLEANING WHEN USING ACID CHEMISTRIES TO FABRICATE MICROELECTRONIC DEVICES AND PRECURSORS THEREOF

The present invention provides treatment strategies that reduce contamination on wafer surfaces that are treated with acid chemistries. The strategies are suitable for use with a wide variety of wafers, including those including sensitive microelectronic features or precursors thereof. These strateg...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BERG ERIK R, SIEFERING KEVIN L
Format:	Patent
Sprache:	eng
Schlagworte:	CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
Online-Zugang:	Volltext bestellen
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