Semiconductor Devices Including Buried Channels

A semiconductor device and a method of fabricating the same are provided. The semiconductor device includes an active region defined by a device isolation layer formed in a cell region, a transistor including a buried gate in the active region, a metal contact formed on the active region positioned...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NAM SEOK-WOO, LIM HAN-JIN, YOO WON-SEOK
Format: Patent
Sprache:eng
Schlagworte:
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