METHOD FOR DETECTING DEFECTS IN A DIFFUSION BARRIER LAYER

A method of providing a semiconductor structure comprising a diffusion barrier layer and a seed layer, the seed layer comprising an alloy of copper and a metal other than copper, depositing an electrically conductive material on the seed layer, performing an annealing process, wherein at least a fir...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HINTZE BERND, UTESS DIRK, KOSCHINSKY FRANK
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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