LDMOSFET HAVING A BRIDGE REGION FORMED BETWEEN TWO GATE ELECTRODES

A split gate power transistor includes a laterally configured power MOSFET including a doped silicon substrate, a stepped gate oxide layer formed on a surface of the substrate, and a split polysilicon layer formed over the stepped gate oxide layer. The stepped gate oxide layer includes a first gate...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GILES FREDERICK P, MCGREGOR JOEL M
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!