BEOL COMPATIBLE FET STRUCTURE

This invention provides structures and a fabrication process for incorporating thin film transistors in back end of the line (BEOL) interconnect structures. The structures and fabrication processes described are compatible with processing requirements for the BEOL interconnect structures. The struct...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BERNSTEIN KERRY, TYBERG CHRISTY S, HOVEL HAROLD J, WISNIEFF ROBERT L, SAENGER KATHERINE L, CHU JACK O, BEDELL STEPHEN W
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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