IN-SITU DEPOSITION OF FILM STACKS

An apparatus for depositing film stacks in-situ (i.e., without a vacuum break or air exposure) are described. In one example, a plasma-enhanced chemical vapor deposition apparatus configured to deposit a plurality of film layers on a substrate without exposing the substrate to a vacuum break between...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WOMACK JOSEPH L, FOX KEITH, SUBRAMONIUM PRAMOD, ALEXY JOHN B, HAVERKAMP JASON DIRK, PETRAGLIA JENNIFER L, NIU DONG, SRIRAM MANDYAM A, BREILING PATRICK G, ANTONELLI GEORGE ANDREW, VAN SCHRAVENDIJK BART J
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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