SEMICONDUCTOR DEVICE MANUFACTURING METHOD

A semiconductor device manufacturing method is provided that includes etching with a plasma a multilayer film including a first film and a second film with differing dielectric constants alternately stacked on a substrate using a photoresist layer arranged on the multilayer film as a mask, and formi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAWAMATA MASAYA, HONDA MASANOBU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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