METHODS FOR FABRICATION OF STABLE ULTRA-LOW REFLECTIVE SURFACE AND THE ULTRA-LOW REFLECTIVE SURFACE ITSELF

A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: YU EU SUN, KIM SEONG JIN, LEE HEON JU, OH KYU HWAN, MOON MYOUNG WOON, KO TAE JUN, KIM SEUNG CHUL
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator YU EU SUN
KIM SEONG JIN
LEE HEON JU
OH KYU HWAN
MOON MYOUNG WOON
KO TAE JUN
KIM SEUNG CHUL
description A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and the third step to prepare a low reflective surface with dual protuberance structure by forming nano-flake layer on the pillar surface of the material surface through oxidation of the surface aluminum of the aluminum surface-materials. The method to prepare low reflective surface can provide a low reflective surface structure that can be applied to photovoltaic device surface or various display surface as a surface able to reduce reflection significantly by absorbing wavelengths in the range of visible and infrared ray through internally total reflection with simple, low cost, and ecofriendly process.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2014320969A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2014320969A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2014320969A13</originalsourceid><addsrcrecordid>eNqNyr0KwjAQAOAsDqK-w4FzoT8idLymdyQQG0guOpYicRDRQn1_XNx1-pZvre4nEuP7COwDMHbBahTrB_AMUbBzBMlJwML5CwRiR1rsmSCmwKgJcOhBzI9kJZLjrVrdpseSd183as8k2hR5fo15madrfub3mGJdVoemLttji1Xz3_oAVIQ3Bw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHODS FOR FABRICATION OF STABLE ULTRA-LOW REFLECTIVE SURFACE AND THE ULTRA-LOW REFLECTIVE SURFACE ITSELF</title><source>esp@cenet</source><creator>YU EU SUN ; KIM SEONG JIN ; LEE HEON JU ; OH KYU HWAN ; MOON MYOUNG WOON ; KO TAE JUN ; KIM SEUNG CHUL</creator><creatorcontrib>YU EU SUN ; KIM SEONG JIN ; LEE HEON JU ; OH KYU HWAN ; MOON MYOUNG WOON ; KO TAE JUN ; KIM SEUNG CHUL</creatorcontrib><description>A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and the third step to prepare a low reflective surface with dual protuberance structure by forming nano-flake layer on the pillar surface of the material surface through oxidation of the surface aluminum of the aluminum surface-materials. The method to prepare low reflective surface can provide a low reflective surface structure that can be applied to photovoltaic device surface or various display surface as a surface able to reduce reflection significantly by absorbing wavelengths in the range of visible and infrared ray through internally total reflection with simple, low cost, and ecofriendly process.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MACHINE TOOLS ; METAL-WORKING NOT OTHERWISE PROVIDED FOR ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PERFORMING OPERATIONS ; PHYSICS ; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING ; WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20141030&amp;DB=EPODOC&amp;CC=US&amp;NR=2014320969A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20141030&amp;DB=EPODOC&amp;CC=US&amp;NR=2014320969A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YU EU SUN</creatorcontrib><creatorcontrib>KIM SEONG JIN</creatorcontrib><creatorcontrib>LEE HEON JU</creatorcontrib><creatorcontrib>OH KYU HWAN</creatorcontrib><creatorcontrib>MOON MYOUNG WOON</creatorcontrib><creatorcontrib>KO TAE JUN</creatorcontrib><creatorcontrib>KIM SEUNG CHUL</creatorcontrib><title>METHODS FOR FABRICATION OF STABLE ULTRA-LOW REFLECTIVE SURFACE AND THE ULTRA-LOW REFLECTIVE SURFACE ITSELF</title><description>A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and the third step to prepare a low reflective surface with dual protuberance structure by forming nano-flake layer on the pillar surface of the material surface through oxidation of the surface aluminum of the aluminum surface-materials. The method to prepare low reflective surface can provide a low reflective surface structure that can be applied to photovoltaic device surface or various display surface as a surface able to reduce reflection significantly by absorbing wavelengths in the range of visible and infrared ray through internally total reflection with simple, low cost, and ecofriendly process.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MACHINE TOOLS</subject><subject>METAL-WORKING NOT OTHERWISE PROVIDED FOR</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><subject>WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyr0KwjAQAOAsDqK-w4FzoT8idLymdyQQG0guOpYicRDRQn1_XNx1-pZvre4nEuP7COwDMHbBahTrB_AMUbBzBMlJwML5CwRiR1rsmSCmwKgJcOhBzI9kJZLjrVrdpseSd183as8k2hR5fo15madrfub3mGJdVoemLttji1Xz3_oAVIQ3Bw</recordid><startdate>20141030</startdate><enddate>20141030</enddate><creator>YU EU SUN</creator><creator>KIM SEONG JIN</creator><creator>LEE HEON JU</creator><creator>OH KYU HWAN</creator><creator>MOON MYOUNG WOON</creator><creator>KO TAE JUN</creator><creator>KIM SEUNG CHUL</creator><scope>EVB</scope></search><sort><creationdate>20141030</creationdate><title>METHODS FOR FABRICATION OF STABLE ULTRA-LOW REFLECTIVE SURFACE AND THE ULTRA-LOW REFLECTIVE SURFACE ITSELF</title><author>YU EU SUN ; KIM SEONG JIN ; LEE HEON JU ; OH KYU HWAN ; MOON MYOUNG WOON ; KO TAE JUN ; KIM SEUNG CHUL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2014320969A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MACHINE TOOLS</topic><topic>METAL-WORKING NOT OTHERWISE PROVIDED FOR</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><topic>WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL</topic><toplevel>online_resources</toplevel><creatorcontrib>YU EU SUN</creatorcontrib><creatorcontrib>KIM SEONG JIN</creatorcontrib><creatorcontrib>LEE HEON JU</creatorcontrib><creatorcontrib>OH KYU HWAN</creatorcontrib><creatorcontrib>MOON MYOUNG WOON</creatorcontrib><creatorcontrib>KO TAE JUN</creatorcontrib><creatorcontrib>KIM SEUNG CHUL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YU EU SUN</au><au>KIM SEONG JIN</au><au>LEE HEON JU</au><au>OH KYU HWAN</au><au>MOON MYOUNG WOON</au><au>KO TAE JUN</au><au>KIM SEUNG CHUL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHODS FOR FABRICATION OF STABLE ULTRA-LOW REFLECTIVE SURFACE AND THE ULTRA-LOW REFLECTIVE SURFACE ITSELF</title><date>2014-10-30</date><risdate>2014</risdate><abstract>A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and the third step to prepare a low reflective surface with dual protuberance structure by forming nano-flake layer on the pillar surface of the material surface through oxidation of the surface aluminum of the aluminum surface-materials. The method to prepare low reflective surface can provide a low reflective surface structure that can be applied to photovoltaic device surface or various display surface as a surface able to reduce reflection significantly by absorbing wavelengths in the range of visible and infrared ray through internally total reflection with simple, low cost, and ecofriendly process.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2014320969A1
source esp@cenet
subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MACHINE TOOLS
METAL-WORKING NOT OTHERWISE PROVIDED FOR
METALLURGY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PERFORMING OPERATIONS
PHYSICS
SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL
title METHODS FOR FABRICATION OF STABLE ULTRA-LOW REFLECTIVE SURFACE AND THE ULTRA-LOW REFLECTIVE SURFACE ITSELF
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T06%3A52%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YU%20EU%20SUN&rft.date=2014-10-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2014320969A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true