FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the e...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | DE METSENAERE CHRISTOPHE ROPS CORNELIUS MARIA VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS VAN DE WINKEL JIMMY MATHEUS WILHELMUS RIEPEN MICHEL BERKVENS PAUL PETRUS JOANNES KEMPER NICOLAAS RUDOLF VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS VAN DEN HEUVEL MARTINUS WILHELMUS |
| description | An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2014300879A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2014300879A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2014300879A13</originalsourceid><addsrcrecordid>eNrjZPB38wn1dFFwjQgJcnQO8fT3UwiODA5x9dVR8PEM8fB3D3IM8PB0VnAMCHAMcgwJDVZw9HNRcHEN83R2VfB19At1A-oKDfL0c1fwdQWqd-FhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhibGBgYW5paOhsbEqQIAJXQv-w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><source>esp@cenet</source><creator>DE METSENAERE CHRISTOPHE ; ROPS CORNELIUS MARIA ; VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS ; VAN DE WINKEL JIMMY MATHEUS WILHELMUS ; RIEPEN MICHEL ; BERKVENS PAUL PETRUS JOANNES ; KEMPER NICOLAAS RUDOLF ; VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS ; VAN DEN HEUVEL MARTINUS WILHELMUS</creator><creatorcontrib>DE METSENAERE CHRISTOPHE ; ROPS CORNELIUS MARIA ; VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS ; VAN DE WINKEL JIMMY MATHEUS WILHELMUS ; RIEPEN MICHEL ; BERKVENS PAUL PETRUS JOANNES ; KEMPER NICOLAAS RUDOLF ; VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS ; VAN DEN HEUVEL MARTINUS WILHELMUS</creatorcontrib><description>An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BLASTING ; CINEMATOGRAPHY ; ELECTROGRAPHY ; ENGINE PLANTS IN GENERAL ; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES ; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL ; HEATING ; HOLOGRAPHY ; LIGHTING ; MACHINES OR ENGINES IN GENERAL ; MATERIALS THEREFOR ; MECHANICAL ENGINEERING ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; STEAM ENGINES ; WEAPONS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141009&DB=EPODOC&CC=US&NR=2014300879A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141009&DB=EPODOC&CC=US&NR=2014300879A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DE METSENAERE CHRISTOPHE</creatorcontrib><creatorcontrib>ROPS CORNELIUS MARIA</creatorcontrib><creatorcontrib>VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS</creatorcontrib><creatorcontrib>VAN DE WINKEL JIMMY MATHEUS WILHELMUS</creatorcontrib><creatorcontrib>RIEPEN MICHEL</creatorcontrib><creatorcontrib>BERKVENS PAUL PETRUS JOANNES</creatorcontrib><creatorcontrib>KEMPER NICOLAAS RUDOLF</creatorcontrib><creatorcontrib>VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS</creatorcontrib><creatorcontrib>VAN DEN HEUVEL MARTINUS WILHELMUS</creatorcontrib><title>FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><description>An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BLASTING</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>ENGINE PLANTS IN GENERAL</subject><subject>GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES</subject><subject>GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL</subject><subject>HEATING</subject><subject>HOLOGRAPHY</subject><subject>LIGHTING</subject><subject>MACHINES OR ENGINES IN GENERAL</subject><subject>MATERIALS THEREFOR</subject><subject>MECHANICAL ENGINEERING</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>STEAM ENGINES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPB38wn1dFFwjQgJcnQO8fT3UwiODA5x9dVR8PEM8fB3D3IM8PB0VnAMCHAMcgwJDVZw9HNRcHEN83R2VfB19At1A-oKDfL0c1fwdQWqd-FhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGhibGBgYW5paOhsbEqQIAJXQv-w</recordid><startdate>20141009</startdate><enddate>20141009</enddate><creator>DE METSENAERE CHRISTOPHE</creator><creator>ROPS CORNELIUS MARIA</creator><creator>VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS</creator><creator>VAN DE WINKEL JIMMY MATHEUS WILHELMUS</creator><creator>RIEPEN MICHEL</creator><creator>BERKVENS PAUL PETRUS JOANNES</creator><creator>KEMPER NICOLAAS RUDOLF</creator><creator>VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS</creator><creator>VAN DEN HEUVEL MARTINUS WILHELMUS</creator><scope>EVB</scope></search><sort><creationdate>20141009</creationdate><title>FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><author>DE METSENAERE CHRISTOPHE ; ROPS CORNELIUS MARIA ; VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS ; VAN DE WINKEL JIMMY MATHEUS WILHELMUS ; RIEPEN MICHEL ; BERKVENS PAUL PETRUS JOANNES ; KEMPER NICOLAAS RUDOLF ; VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS ; VAN DEN HEUVEL MARTINUS WILHELMUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2014300879A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BLASTING</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>ENGINE PLANTS IN GENERAL</topic><topic>GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES</topic><topic>GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL</topic><topic>HEATING</topic><topic>HOLOGRAPHY</topic><topic>LIGHTING</topic><topic>MACHINES OR ENGINES IN GENERAL</topic><topic>MATERIALS THEREFOR</topic><topic>MECHANICAL ENGINEERING</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>STEAM ENGINES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>DE METSENAERE CHRISTOPHE</creatorcontrib><creatorcontrib>ROPS CORNELIUS MARIA</creatorcontrib><creatorcontrib>VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS</creatorcontrib><creatorcontrib>VAN DE WINKEL JIMMY MATHEUS WILHELMUS</creatorcontrib><creatorcontrib>RIEPEN MICHEL</creatorcontrib><creatorcontrib>BERKVENS PAUL PETRUS JOANNES</creatorcontrib><creatorcontrib>KEMPER NICOLAAS RUDOLF</creatorcontrib><creatorcontrib>VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS</creatorcontrib><creatorcontrib>VAN DEN HEUVEL MARTINUS WILHELMUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DE METSENAERE CHRISTOPHE</au><au>ROPS CORNELIUS MARIA</au><au>VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS</au><au>VAN DE WINKEL JIMMY MATHEUS WILHELMUS</au><au>RIEPEN MICHEL</au><au>BERKVENS PAUL PETRUS JOANNES</au><au>KEMPER NICOLAAS RUDOLF</au><au>VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS</au><au>VAN DEN HEUVEL MARTINUS WILHELMUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><date>2014-10-09</date><risdate>2014</risdate><abstract>An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2014300879A1 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BLASTING CINEMATOGRAPHY ELECTROGRAPHY ENGINE PLANTS IN GENERAL GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL HEATING HOLOGRAPHY LIGHTING MACHINES OR ENGINES IN GENERAL MATERIALS THEREFOR MECHANICAL ENGINEERING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS STEAM ENGINES WEAPONS |
| title | FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T02%3A50%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=DE%20METSENAERE%20CHRISTOPHE&rft.date=2014-10-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2014300879A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |