METHODS OF FORMING TRENCH/HOLE TYPE FEATURES IN A LAYER OF MATERIAL OF AN INTEGRATED CIRCUIT PRODUCT

One illustrative method disclosed herein involves forming a layer of insulating material, forming a patterned layer of photoresist above the layer of insulating material, wherein the patterned layer of photoresist has an opening defined therein, forming an internal spacer within the opening in the p...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TSENG CHIAHSUN, JANG LINUS, MATSUI YOSHINORI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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