INDUCTIVE ELEMENT WITH INTERRUPTER REGION AND METHOD FOR FORMING

A semiconductor device structure a semiconductor substrate having a first conductivity type and a top surface. A plurality of first doped regions is at a first depth below the top surface arranged in a checkerboard fashion. The first doped regions are of a second conductivity type. A dielectric laye...

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Bibliographische Detailangaben
Hauptverfasser: DEMIRCAN ERTUGRUL, MCNELLY THOMAS F
Format: Patent
Sprache:eng
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