SYSTEM AND METHOD TO DETERMINE DEPTH FOR OPTICAL WAFER INSPECTION

A computer-based method for inspecting a wafer, including: storing, in a memory element for at least one computer, computer readable instructions; detecting a first light beam rotating in a first spiral about a first central axis; and executing, using a processor for the at least one computer, the c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	DANEN ROBERT, HAURYLAU MIKHAIL, KOLCHIN PAVEL
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS TESTING
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