Method of Operating a Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product

A reticle is loaded into a lithographic apparatus. The apparatus performs measurements on the reticle, so as to calculate alignment parameters for transferring the pattern accurately to substrates. Tests are performed to detect possible contamination of the reticle or its support. Either operation p...

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Bibliographische Detailangaben

Hauptverfasser:	YPMA ALEXANDER, HENKE WOLFGANG, SLOTBOOM DAAN MAURITS, KEA MARC JURIAN, LUEHRMANN PAUL FRANK, SCHMITT-WEAVER EMIL PETER, BOON EDUARDUS JOHANNES GERARDUS, VAN DAMME JEAN-PHILIPPE XAVIER
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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