METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND COMPONENT OF THIS TYPE

METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND COMPONENT OF THIS TYPE

A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: wor...

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Hauptverfasser: SIEKMANN HEIKO, KIEREY HOLGER, BRESAN ANDRE
Format: Patent
Sprache:eng
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OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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KIEREY HOLGER
BRESAN ANDRE
description A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.
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subjects OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
title METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND COMPONENT OF THIS TYPE
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