COMPOSITION FOR AND METHOD OF SUPPRESSING TITANIUM NITRIDE CORROSION

Cleaning compositions and processes for cleaning residue from a microelectronic device having said residue thereon. The composition comprises at least one amine, at least one oxidizing agent, water, and at least one borate species and achieves highly efficacious cleaning of the residue material, inc...

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Bibliographische Detailangaben
Hauptverfasser: PAYNE MAKONNEN, TOTIR GEORGE GABRIEL, COOPER EMANUEL I
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Cleaning compositions and processes for cleaning residue from a microelectronic device having said residue thereon. The composition comprises at least one amine, at least one oxidizing agent, water, and at least one borate species and achieves highly efficacious cleaning of the residue material, including post-ash residue, post-etch residue, post-CMP residue, particles, organic contaminants, metal ion contaminants, and combinations thereof from the microelectronic device while simultaneously not damaging the titanium nitride layers and low-k dielectric materials also present on the device.