Methods Of Correcting For Variation Across Substrates During Photolithography

Some embodiments include methods for correcting for variation across substrates. A difference map is created to indicate differences between a desired pattern that is to be formed across the substrates utilizing photolithographic processing and a signature pattern representing the actual pattern for...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIGHT SCOTT L, BOSSART TIM H, HE YUAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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