METHODS FOR FORMING FINE PATTERNS OF A SEMICONDUCTOR DEVICE

Methods of forming fine patterns are provided. The methods may include forming first hard mask patterns extending in a first direction on a lower layer, forming second hard mask patterns filling gap regions between the first hard mask patterns, forming first mask patterns extending in a second direc...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NAM SEOKWOO, YOON KUKHAN, PARK JOON-SOO, KIM CHEOLHONG, KIM JOON
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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