METHODS AND APPARATUS FOR SUPPLYING PROCESS GAS IN A PLASMA PROCESSING SYSTEM

Methods and apparatus for supplying gas in a plasma processing system that employs the single line drop approach wherein a regulator is shared among multiple mass flow controllers. In one or more embodiments, an accumulator is provided and coupled in gaseous communication with a shared manifold to r...

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Hauptverfasser: SHAREEF IQBAL A, SPYROPOULOS EVANGELOS, TASKAR MARK
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creator SHAREEF IQBAL A
SPYROPOULOS EVANGELOS
TASKAR MARK
description Methods and apparatus for supplying gas in a plasma processing system that employs the single line drop approach wherein a regulator is shared among multiple mass flow controllers. In one or more embodiments, an accumulator is provided and coupled in gaseous communication with a shared manifold to reduce pressure spikes and dips. A filter, which may be replaceable or non-replaceable separate from the accumulator, is integrated with the accumulator in one or more embodiments.
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subjects APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
BLASTING
ENGINEERING ELEMENTS AND UNITS
GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS
HEATING
JOINTS OR FITTINGS FOR PIPES
LIGHTING
MEANS FOR THERMAL INSULATION IN GENERAL
MECHANICAL ENGINEERING
PERFORMING OPERATIONS
PIPES
SPRAYING OR ATOMISING IN GENERAL
SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING
THERMAL INSULATION IN GENERAL
TRANSPORTING
WEAPONS
title METHODS AND APPARATUS FOR SUPPLYING PROCESS GAS IN A PLASMA PROCESSING SYSTEM
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