MULTI-LAYER SUBSTRATE STRUCTURE AND MANUFACTURING METHOD FOR THE SAME

A method for manufacturing a multi-layer substrate structure such as a CSOI wafer structure (cavity-SOI, silicon-on-insulator) comprising obtaining a first and second wafer, such as two silicon wafers, wherein at least one of the wafers may be optionally provided with a material layer such as an oxi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HENTTINEN KIMMO, SUNI TOMMI, KATTELUS HANNU, PUURUNEN RIIKKA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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