EUV Exposure Apparatus
A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | HAUF MARKUS WALTER HOLGER STICKEL FRANZ-JOSEF HEMBACHER STEFAN LOERING ULRICH LAUFER TIMO BAER NORMAN KWAN YIM-BUN-PATRICK VAN SCHOOT JAN NATT OLIVER WITTICH GERO KUERZ PETER LIMBACH GUIDO |
| description | A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2013141707A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2013141707A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2013141707A13</originalsourceid><addsrcrecordid>eNrjZBBzDQ1TcK0oyC8uLUpVcCwoSCxKLCkt5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGxoYmhuYG5o6GxsSpAgAD7CIh</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>EUV Exposure Apparatus</title><source>esp@cenet</source><creator>HAUF MARKUS ; WALTER HOLGER ; STICKEL FRANZ-JOSEF ; HEMBACHER STEFAN ; LOERING ULRICH ; LAUFER TIMO ; BAER NORMAN ; KWAN YIM-BUN-PATRICK ; VAN SCHOOT JAN ; NATT OLIVER ; WITTICH GERO ; KUERZ PETER ; LIMBACH GUIDO</creator><creatorcontrib>HAUF MARKUS ; WALTER HOLGER ; STICKEL FRANZ-JOSEF ; HEMBACHER STEFAN ; LOERING ULRICH ; LAUFER TIMO ; BAER NORMAN ; KWAN YIM-BUN-PATRICK ; VAN SCHOOT JAN ; NATT OLIVER ; WITTICH GERO ; KUERZ PETER ; LIMBACH GUIDO</creatorcontrib><description>A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHOTOGRAPHY ; PHYSICS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130606&DB=EPODOC&CC=US&NR=2013141707A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130606&DB=EPODOC&CC=US&NR=2013141707A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAUF MARKUS</creatorcontrib><creatorcontrib>WALTER HOLGER</creatorcontrib><creatorcontrib>STICKEL FRANZ-JOSEF</creatorcontrib><creatorcontrib>HEMBACHER STEFAN</creatorcontrib><creatorcontrib>LOERING ULRICH</creatorcontrib><creatorcontrib>LAUFER TIMO</creatorcontrib><creatorcontrib>BAER NORMAN</creatorcontrib><creatorcontrib>KWAN YIM-BUN-PATRICK</creatorcontrib><creatorcontrib>VAN SCHOOT JAN</creatorcontrib><creatorcontrib>NATT OLIVER</creatorcontrib><creatorcontrib>WITTICH GERO</creatorcontrib><creatorcontrib>KUERZ PETER</creatorcontrib><creatorcontrib>LIMBACH GUIDO</creatorcontrib><title>EUV Exposure Apparatus</title><description>A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHOTOGRAPHY</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBBzDQ1TcK0oyC8uLUpVcCwoSCxKLCkt5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGxoYmhuYG5o6GxsSpAgAD7CIh</recordid><startdate>20130606</startdate><enddate>20130606</enddate><creator>HAUF MARKUS</creator><creator>WALTER HOLGER</creator><creator>STICKEL FRANZ-JOSEF</creator><creator>HEMBACHER STEFAN</creator><creator>LOERING ULRICH</creator><creator>LAUFER TIMO</creator><creator>BAER NORMAN</creator><creator>KWAN YIM-BUN-PATRICK</creator><creator>VAN SCHOOT JAN</creator><creator>NATT OLIVER</creator><creator>WITTICH GERO</creator><creator>KUERZ PETER</creator><creator>LIMBACH GUIDO</creator><scope>EVB</scope></search><sort><creationdate>20130606</creationdate><title>EUV Exposure Apparatus</title><author>HAUF MARKUS ; WALTER HOLGER ; STICKEL FRANZ-JOSEF ; HEMBACHER STEFAN ; LOERING ULRICH ; LAUFER TIMO ; BAER NORMAN ; KWAN YIM-BUN-PATRICK ; VAN SCHOOT JAN ; NATT OLIVER ; WITTICH GERO ; KUERZ PETER ; LIMBACH GUIDO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2013141707A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHOTOGRAPHY</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HAUF MARKUS</creatorcontrib><creatorcontrib>WALTER HOLGER</creatorcontrib><creatorcontrib>STICKEL FRANZ-JOSEF</creatorcontrib><creatorcontrib>HEMBACHER STEFAN</creatorcontrib><creatorcontrib>LOERING ULRICH</creatorcontrib><creatorcontrib>LAUFER TIMO</creatorcontrib><creatorcontrib>BAER NORMAN</creatorcontrib><creatorcontrib>KWAN YIM-BUN-PATRICK</creatorcontrib><creatorcontrib>VAN SCHOOT JAN</creatorcontrib><creatorcontrib>NATT OLIVER</creatorcontrib><creatorcontrib>WITTICH GERO</creatorcontrib><creatorcontrib>KUERZ PETER</creatorcontrib><creatorcontrib>LIMBACH GUIDO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAUF MARKUS</au><au>WALTER HOLGER</au><au>STICKEL FRANZ-JOSEF</au><au>HEMBACHER STEFAN</au><au>LOERING ULRICH</au><au>LAUFER TIMO</au><au>BAER NORMAN</au><au>KWAN YIM-BUN-PATRICK</au><au>VAN SCHOOT JAN</au><au>NATT OLIVER</au><au>WITTICH GERO</au><au>KUERZ PETER</au><au>LIMBACH GUIDO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>EUV Exposure Apparatus</title><date>2013-06-06</date><risdate>2013</risdate><abstract>A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2013141707A1 |
| source | esp@cenet |
| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHOTOGRAPHY PHYSICS |
| title | EUV Exposure Apparatus |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T13%3A40%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HAUF%20MARKUS&rft.date=2013-06-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2013141707A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |