Apparatus and Method for Providing a Localized Speed Variance of an Advancing Substrate

Methods and apparatuses discussed herein provide for localized speed changes of an advancing substrate. Embodiments of a localized speed varying apparatus may include first and second substrate guides positioned upstream and downstream of a processing station, respectively. The substrate guides may...

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Bibliographische Detailangaben
1. Verfasser: GILL NATHAN ALAN
Format: Patent
Sprache:eng
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