EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GRUNER TORALF, MALLMANN JOERG, KNEER BERNHARD, WEGMANN ULRICH, KUGLER JENS, SCHUSTER KARL-HEINZ, EHRMANN ALBRECHT, LOERING ULRICH, GEUPPERT BERNHARD, SORG FRANZ, WABRA NORBERT, HOCH RAINER
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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