METHOD OF CLEANING ALUMINUM PLASMA CHAMBER PARTS

A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FANG YAN, RAMANATHAN SIVAKAMI, OUTKA DUANE, AVOYAN ARMEN, MULGREW PAUL, HUANG TUOCHUAN, CHANG JEREMY, SHIH HONG, ANDERSON ROBERT, DAUGHERTY JOHN, LARSON DEAN J
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY
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