METHOD FOR CARBONITRIDING AT LEAST ONE COMPONENT IN A TREATMENT CHAMBER
The invention relates to a method for carbonitriding at least one component (12) in a treatment chamber (16), in which at least one process gas (28; 30) is introduced into the treatment chamber (16), wherein a hydrogen content (44) is detected in an atmosphere developing in the treatment chamber (16...
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creator | SCHWARZER JOCHEN HAGYMASI LAZLO WALDENMAIER THOMAS |
description | The invention relates to a method for carbonitriding at least one component (12) in a treatment chamber (16), in which at least one process gas (28; 30) is introduced into the treatment chamber (16), wherein a hydrogen content (44) is detected in an atmosphere developing in the treatment chamber (16) and is maintained in a desired range (55; 57) at least at intervals by influencing of the amount of the process gas (28; 30) that is fed. |
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30) is introduced into the treatment chamber (16), wherein a hydrogen content (44) is detected in an atmosphere developing in the treatment chamber (16) and is maintained in a desired range (55; 57) at least at intervals by influencing of the amount of the process gas (28; 30) that is fed.</description><language>eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PERFORMING OPERATIONS ; SPRAYING OR ATOMISING IN GENERAL ; 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30) is introduced into the treatment chamber (16), wherein a hydrogen content (44) is detected in an atmosphere developing in the treatment chamber (16) and is maintained in a desired range (55; 57) at least at intervals by influencing of the amount of the process gas (28; 30) that is fed.</description><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD3dQ3x8HdRcPMPUnB2DHLy9_MMCfJ08fRzV3AMUfBxdQwOUfD3c1Vw9vcNANJ-IQqefgqOCiFBro4hviCus4ejr5NrEA8Da1piTnEqL5TmZlB2cw1x9tBNLciPTy0uSExOzUstiQ8NNjIwNDYwNjc0N3Y0NCZOFQBpYi0w</recordid><startdate>20130214</startdate><enddate>20130214</enddate><creator>SCHWARZER JOCHEN</creator><creator>HAGYMASI LAZLO</creator><creator>WALDENMAIER THOMAS</creator><scope>EVB</scope></search><sort><creationdate>20130214</creationdate><title>METHOD FOR CARBONITRIDING AT LEAST ONE COMPONENT IN A TREATMENT CHAMBER</title><author>SCHWARZER JOCHEN ; HAGYMASI LAZLO ; WALDENMAIER THOMAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2013037173A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHWARZER JOCHEN</creatorcontrib><creatorcontrib>HAGYMASI LAZLO</creatorcontrib><creatorcontrib>WALDENMAIER THOMAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHWARZER JOCHEN</au><au>HAGYMASI LAZLO</au><au>WALDENMAIER THOMAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR CARBONITRIDING AT LEAST ONE COMPONENT IN A TREATMENT CHAMBER</title><date>2013-02-14</date><risdate>2013</risdate><abstract>The invention relates to a method for carbonitriding at least one component (12) in a treatment chamber (16), in which at least one process gas (28; 30) is introduced into the treatment chamber (16), wherein a hydrogen content (44) is detected in an atmosphere developing in the treatment chamber (16) and is maintained in a desired range (55; 57) at least at intervals by influencing of the amount of the process gas (28; 30) that is fed.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
title | METHOD FOR CARBONITRIDING AT LEAST ONE COMPONENT IN A TREATMENT CHAMBER |
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