DRAM DEVICES AND METHODS OF MANUFACTURING THE SAME

A DRAM device includes a substrate including an active region having an island shape and a buried gate pattern. A mask pattern is over an upper surface portion of the substrate between portions of the buried gate pattern. A capping insulating layer fills a gap between portions of the mask pattern. A...

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Bibliographische Detailangaben

Hauptverfasser:	PARK JONGUL, JEONG SANG-SUP, KANG BYUNG-JIN
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRICITY
Online-Zugang:	Volltext bestellen
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