METHOD AND APPARATUS FOR MINIMIZING OVERLAY ERRORS IN LITHOGRAPHY
The invention relates to a method for minimizing errors of a plurality of photolithographic masks, the plurality of photolithographic masks serving for successively processing a substrate, the method comprises determining a reference displacement vector field, the reference displacement vector field...
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| creator | PFORR RAINER |
| description | The invention relates to a method for minimizing errors of a plurality of photolithographic masks, the plurality of photolithographic masks serving for successively processing a substrate, the method comprises determining a reference displacement vector field, the reference displacement vector field correlates displacement vectors of the errors of the plurality of photolithographic masks, determining for each of the photolithographic mask a difference displacement vector field as a difference between the reference displacement vector field and the displacement vectors of the errors of the respective photolithographic mask, and correcting the errors for each of the photolithographic masks using the respective difference displacement vector field. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2012227014A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2012227014A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2012227014A13</originalsourceid><addsrcrecordid>eNrjZHD0dQ3x8HdRcPQD4oAAxyDHkNBgBTf_IAVfTz9PX88oTz93Bf8w1yAfx0gF16Ag_6BgBU8_BR9PoC73IMcAj0geBta0xJziVF4ozc2g7OYa4uyhm1qQH59aXJCYnJqXWhIfGmxkYGhkZGRuYGjiaGhMnCoAmxYsDg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND APPARATUS FOR MINIMIZING OVERLAY ERRORS IN LITHOGRAPHY</title><source>esp@cenet</source><creator>PFORR RAINER</creator><creatorcontrib>PFORR RAINER</creatorcontrib><description>The invention relates to a method for minimizing errors of a plurality of photolithographic masks, the plurality of photolithographic masks serving for successively processing a substrate, the method comprises determining a reference displacement vector field, the reference displacement vector field correlates displacement vectors of the errors of the plurality of photolithographic masks, determining for each of the photolithographic mask a difference displacement vector field as a difference between the reference displacement vector field and the displacement vectors of the errors of the respective photolithographic mask, and correcting the errors for each of the photolithographic masks using the respective difference displacement vector field.</description><language>eng</language><subject>CALCULATING ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; PHYSICS</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120906&DB=EPODOC&CC=US&NR=2012227014A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120906&DB=EPODOC&CC=US&NR=2012227014A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PFORR RAINER</creatorcontrib><title>METHOD AND APPARATUS FOR MINIMIZING OVERLAY ERRORS IN LITHOGRAPHY</title><description>The invention relates to a method for minimizing errors of a plurality of photolithographic masks, the plurality of photolithographic masks serving for successively processing a substrate, the method comprises determining a reference displacement vector field, the reference displacement vector field correlates displacement vectors of the errors of the plurality of photolithographic masks, determining for each of the photolithographic mask a difference displacement vector field as a difference between the reference displacement vector field and the displacement vectors of the errors of the respective photolithographic mask, and correcting the errors for each of the photolithographic masks using the respective difference displacement vector field.</description><subject>CALCULATING</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD0dQ3x8HdRcPQD4oAAxyDHkNBgBTf_IAVfTz9PX88oTz93Bf8w1yAfx0gF16Ag_6BgBU8_BR9PoC73IMcAj0geBta0xJziVF4ozc2g7OYa4uyhm1qQH59aXJCYnJqXWhIfGmxkYGhkZGRuYGjiaGhMnCoAmxYsDg</recordid><startdate>20120906</startdate><enddate>20120906</enddate><creator>PFORR RAINER</creator><scope>EVB</scope></search><sort><creationdate>20120906</creationdate><title>METHOD AND APPARATUS FOR MINIMIZING OVERLAY ERRORS IN LITHOGRAPHY</title><author>PFORR RAINER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2012227014A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>PFORR RAINER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PFORR RAINER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND APPARATUS FOR MINIMIZING OVERLAY ERRORS IN LITHOGRAPHY</title><date>2012-09-06</date><risdate>2012</risdate><abstract>The invention relates to a method for minimizing errors of a plurality of photolithographic masks, the plurality of photolithographic masks serving for successively processing a substrate, the method comprises determining a reference displacement vector field, the reference displacement vector field correlates displacement vectors of the errors of the plurality of photolithographic masks, determining for each of the photolithographic mask a difference displacement vector field as a difference between the reference displacement vector field and the displacement vectors of the errors of the respective photolithographic mask, and correcting the errors for each of the photolithographic masks using the respective difference displacement vector field.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS |
| title | METHOD AND APPARATUS FOR MINIMIZING OVERLAY ERRORS IN LITHOGRAPHY |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T10%3A30%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PFORR%20RAINER&rft.date=2012-09-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2012227014A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |