Integrated Circuit Having Interleaved Gridded Features, Mask Set, and Method for Printing

A method for fabricating an integrated circuit includes the steps of: providing a substrate having a semiconductor surface; providing a hardmask material on the semiconductor surface. For at least one masking level of the integrated circuit: providing a mask pattern for the masking level partitioned...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ATON THOMAS J, PLUMTON DONALD
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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