System and Method for Semiconductor Device Fabrication Using Modeling

In one embodiment, a method of manufacturing a semiconductor device includes using a processor to generate a first three dimensional (3-D) resist profile for a first process condition using an layout mask of a target structure. The method further includes using a processor to generate a second 3-D r...

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Hauptverfasser:	SARMA CHANDRASEKHAR, BAILEY TODD C
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS
Online-Zugang:	Volltext bestellen
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