METHOD FOR COMPENSATING FOR VARIATIONS IN STRUCTURES OF AN INTEGRATED CIRCUIT

METHOD FOR COMPENSATING FOR VARIATIONS IN STRUCTURES OF AN INTEGRATED CIRCUIT

A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) apply...

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Hauptverfasser: STAMPER ANTHONY K, LEIDY ROBERT KENNETH, PASTEL PAUL WILLIAM, HULVEY MICHAEL D, PORTH BRUCE WALTER, CREDENDINO SANTO, KUPPUSAMY JOTHIMALAR
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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creator STAMPER ANTHONY K
LEIDY ROBERT KENNETH
PASTEL PAUL WILLIAM
HULVEY MICHAEL D
PORTH BRUCE WALTER
CREDENDINO SANTO
KUPPUSAMY JOTHIMALAR
description A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
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subjects CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
title METHOD FOR COMPENSATING FOR VARIATIONS IN STRUCTURES OF AN INTEGRATED CIRCUIT
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