MULTI-NARY GROUP IB AND VIA BASED SEMICONDUCTOR

Methods and devices are provided for forming multi-nary semiconductor. In one embodiment, a method is provided comprising of depositing a precursor material onto a substrate, wherein the precursor material may include or may be used with an additive to minimize concentration of group IIIA material s...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JACKREL DAVID B, WOODRUFF JACOB, POLLOCK KRISTIN, BROWN GREGORY, DICKEY KATHERINE, STONE PETER
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!