CLICHE AND MANUFACTURING METHOD FOR THE SAME
Provided is a cliche and a method of manufacturing the cliche which can increase or maximize productivity and production yield. The manufacturing method of the cliche includes providing a substrate, forming organic patterns protruding on the substrate, and forming an ink absorption layer on the orga...
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creator | KIM TAEYOUB YOU IN-KYU KOO JAE BON KIM MINSEOK |
description | Provided is a cliche and a method of manufacturing the cliche which can increase or maximize productivity and production yield. The manufacturing method of the cliche includes providing a substrate, forming organic patterns protruding on the substrate, and forming an ink absorption layer on the organic patterns or on the substrate exposed from the organic patterns. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2012125213A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2012125213A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2012125213A13</originalsourceid><addsrcrecordid>eNrjZNBx9vF09nBVcPRzUfB19At1c3QOCQ3y9HNX8HUN8fB3UXDzD1IIASoIdvR15WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGRoZGpkaGxo6GxsSpAgADVSWr</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CLICHE AND MANUFACTURING METHOD FOR THE SAME</title><source>esp@cenet</source><creator>KIM TAEYOUB ; YOU IN-KYU ; KOO JAE BON ; KIM MINSEOK</creator><creatorcontrib>KIM TAEYOUB ; YOU IN-KYU ; KOO JAE BON ; KIM MINSEOK</creatorcontrib><description>Provided is a cliche and a method of manufacturing the cliche which can increase or maximize productivity and production yield. The manufacturing method of the cliche includes providing a substrate, forming organic patterns protruding on the substrate, and forming an ink absorption layer on the organic patterns or on the substrate exposed from the organic patterns.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; LINING MACHINES ; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM ; PRINTING ; PRINTING PLATES OR FOILS ; PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES ; STAMPS ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120524&DB=EPODOC&CC=US&NR=2012125213A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120524&DB=EPODOC&CC=US&NR=2012125213A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM TAEYOUB</creatorcontrib><creatorcontrib>YOU IN-KYU</creatorcontrib><creatorcontrib>KOO JAE BON</creatorcontrib><creatorcontrib>KIM MINSEOK</creatorcontrib><title>CLICHE AND MANUFACTURING METHOD FOR THE SAME</title><description>Provided is a cliche and a method of manufacturing the cliche which can increase or maximize productivity and production yield. The manufacturing method of the cliche includes providing a substrate, forming organic patterns protruding on the substrate, and forming an ink absorption layer on the organic patterns or on the substrate exposed from the organic patterns.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>LINING MACHINES</subject><subject>MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM</subject><subject>PRINTING</subject><subject>PRINTING PLATES OR FOILS</subject><subject>PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES</subject><subject>STAMPS</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBx9vF09nBVcPRzUfB19At1c3QOCQ3y9HNX8HUN8fB3UXDzD1IIASoIdvR15WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGRoZGpkaGxo6GxsSpAgADVSWr</recordid><startdate>20120524</startdate><enddate>20120524</enddate><creator>KIM TAEYOUB</creator><creator>YOU IN-KYU</creator><creator>KOO JAE BON</creator><creator>KIM MINSEOK</creator><scope>EVB</scope></search><sort><creationdate>20120524</creationdate><title>CLICHE AND MANUFACTURING METHOD FOR THE SAME</title><author>KIM TAEYOUB ; YOU IN-KYU ; KOO JAE BON ; KIM MINSEOK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2012125213A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>LINING MACHINES</topic><topic>MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM</topic><topic>PRINTING</topic><topic>PRINTING PLATES OR FOILS</topic><topic>PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES</topic><topic>STAMPS</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM TAEYOUB</creatorcontrib><creatorcontrib>YOU IN-KYU</creatorcontrib><creatorcontrib>KOO JAE BON</creatorcontrib><creatorcontrib>KIM MINSEOK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM TAEYOUB</au><au>YOU IN-KYU</au><au>KOO JAE BON</au><au>KIM MINSEOK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CLICHE AND MANUFACTURING METHOD FOR THE SAME</title><date>2012-05-24</date><risdate>2012</risdate><abstract>Provided is a cliche and a method of manufacturing the cliche which can increase or maximize productivity and production yield. The manufacturing method of the cliche includes providing a substrate, forming organic patterns protruding on the substrate, and forming an ink absorption layer on the organic patterns or on the substrate exposed from the organic patterns.</abstract><oa>free_for_read</oa></addata></record> |
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recordid | cdi_epo_espacenet_US2012125213A1 |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TRANSPORTING TYPEWRITERS |
title | CLICHE AND MANUFACTURING METHOD FOR THE SAME |
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