Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...
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| creator | DUSA MIRCEA KIERS ANTOINE GASTON MARIE DEN BOEF ARIE JEFFREY MARIA LUEHRMANN PAUL FRANK VAN KRAAIJ MARKUS GERARDUS MARTINUS BLEEKER ARNO JAN GROUWSTRA CEDRIC DESIRE PELLEMANS HENRICUS PETRUS MARIA VAN DER SCHAAR MAURITS LAURENTIUS MARIA VAN DOMMELEN YOURI JOHANNES |
| description | An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference. |
| format | Patent |
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The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | COLORIMETRY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING PHYSICS RADIATION PYROMETRY TESTING |
| title | Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization |
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