LITHOGRAPHIC TOOL IN SITU CLEAN FORMULATIONS
Compositions and methods of using said composition for removing polymeric materials from surfaces, preferably cleaning contaminant buildup from a lithography apparatus without total disassembly of said apparatus.
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| creator | VAN BERKEL KIM Y MIRTH GEORGE BOGGS KARL E JIANG PING CHEN TIANNIU BILODEAU STEVEN KORZENSKI MICHAEL B |
| description | Compositions and methods of using said composition for removing polymeric materials from surfaces, preferably cleaning contaminant buildup from a lithography apparatus without total disassembly of said apparatus. |
| format | Patent |
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| language | eng |
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| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | LITHOGRAPHIC TOOL IN SITU CLEAN FORMULATIONS |
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