FILTER MEDIA FOR LIQUID PURIFICATION TO REMOVE TRACE METALS

Filter media for liquid purification, which can remove metal compounds or metal ions containing in polishing or washing liquids such as alkali, acid solution or ultra-pure water used for silicon wafers of semiconductors. Removal of metals from various kind of liquid such as inorganic chemicals, orga...

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Hauptverfasser: SEKO NORIAKI, TAMADA MASAO, MIYAGAWA KIYOKAZU, NAKANO MASANORI, TAKEDA TOSHIHIDE, KAWANO SHIN-ICHI, ABE MITSUGU, UEKI YUJI
Format: Patent
Sprache:eng
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Zusammenfassung:Filter media for liquid purification, which can remove metal compounds or metal ions containing in polishing or washing liquids such as alkali, acid solution or ultra-pure water used for silicon wafers of semiconductors. Removal of metals from various kind of liquid such as inorganic chemicals, organic solvent, or industrial waste water are also the subject of the present invention. The Filter media made of melt-blown nonwoven substrate comprising of aethylene/norbornene copolymer represented by the following formula [1] and/or a polycyclic norbornene polymer represented by the following formulae [2](a),(b),(c) as raw material, wherein said ethylene/norbornene copolymer and said polycyclic norbornene polymer have a glass transition temperature (Tg) selected in a range from 80 to 180° C. and melt volume rate (MVR) (ISO 1133, measuring conditions: 260° C., 2.16 kg) of 30 cm3/10 min or more, and wherein said melt-blown nonwoven substrate is constituted of fibers having an average fiber diameter ranging from 1 to 30 μm is applied. On such melt-blown nonwoven substrate, ion-exchangeable or chelate group is introduced through graft polymerization of vinyl monomer. [wherein ethylene unit (X) and norbornene unit (Y) is chosen from 1 to 99 mole %] [wherein m and n represent degree of polymerization and are chosen from 1 or more.]